I need at least one page of text, max two, double spaced #12 Times New Roman, describing the general theory of how APCVD works, including a few typical expected basic chemical compound reaction/bonding methods at the sample surface. Also at least one visual on additional pages showing typical layout, similar to mine preferably. As well as scholarly references.
This is for a section of a Semiconductor Physics Master’s Thesis regarding the production and measurement of 2D thin film materials 0.5nm+, using APCVD. I basically need a reworded description to pass the plagiarism checker TurnItIn.
The process should be easily found described in scholarly papers and books on thin film fabrication, 2D materials, CVD methods, etc.
Background; we flow compressed argon gas from bottle, through regulator, then mass flow controller, into 1 inch quartz glass tube furnace tube which extends from both sides of an electric hot wall/chamber tube furnace. Before entering the tube furnace, gas in the glass tube passes over a 4 inch ceramic boat holding selenium which is heated by an externally wrapped heat tape around that upstream area of tube. Then selenium carrying argon gas continues into the single zone furnace over another 4inch ceramic boat holding 10mm long thin sapphire substrate with platinum layer samples, interacting with and forming PtSe2 on the substrate surface. Then the gas/tube passes to a T-fitting going either to a vacuum pump, or to a vent tube and water trap.
